Megasonic processing has emerged as an increasingly important method of cleaning contamination and damage sensitive products. Our Sapphire MegPie® (Megasonic Transducer) can be used for most of your demanding contamination- sensitive cleaning needs. Excellent results have been achieved.
The MegPie® is a Patented Radial Megasonic Array designed to apply uniform acoustic energy to a rotating substrate.
Uniformity Energy Applied to Substrate
Easy Integration into your existing spin coater
Standard and Custom Designs
The ProSys MegPie® Megasonic transducer
The ProSys MegPie Megasonic Transducer applies a uniform field of
acoustic energy through a thin layer of process fluid (meniscus) to a
substrate being cleaned. The ProSys MicroPulse control and the ProSys
MicroPower generator supply RF energy to the MegPie Array.
The space between the transducer surface and the substrate surface
(Gap) needs to be set to a given dimension based upon the end user’s
final application. The final Gap will usually be between 0.1 and 3.0mm
depending on the process fluid parameters and the size and rotational
speed of the substrate.
An RPM of greater than 60 is NOT recommended. The higher RPM will
make it difficult to maintain wetted surfaces between the substrate and
the MegPie. (Faster moving surfaces could create voids and gas bubbles
and cause attenuation of the acoustic energy.)
The spin coater system can dispense DIW from the same delivery manifold as used by the Megpie without activating the megasonic function. (see detail photo).
fluid delivery manifold – megpie
The dispense line of the demo unit is equipped with our standard SSV valve from directly controlled by the spinner. In case you want to have an additional dispense line (i.e. with different nozzl, such as spray, jet,…) please ask for a special lid and relative components (valve, swivel head,…).